A Reasonably Practical XUV Laser for Applications

Tracy Sharp Clement, Csaba Toth, Jun Wu, and James F. Young

Electrical and Computer Engineering Department
Rice University, 6100 Main Street, Houston, TX 77005-1892 USA
713-527-4721; fax: 713-524-5237; young@ece.rice.edu

IEEE Journal of Quantum Electronics Vol. 30, 2136-2140 (1994).


Abstract

We describe a laboratory-scale, 109 nm Xe Auger laser pumped by an all-commercial, high repetition rate, Nd:YAG laser system. The Xe laser provides pulse energies up to 1 microjoule, and an average flux of 3x10E12 photons per second at 11.5 eV. Measurements of the gain, output energy, and output beam shape are reported, along with an investigation of the time dependence of the gain.

This work was sponsored by the U.S. Air Force Office of Scientific Research; T. S. Clement was supported by an IBM Graduate Fellowship.


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