Vacuum Ultraviolet Optical Microscopy

J. F. Young, H. M. Duiker, I. Ferincz, and T. Dennis

Electrical and Computer Engineering Department
Rice University, 6100 Main Street, Houston, TX 77005-1892 USA
713-527-4721; fax: 713-524-5237; young@ece.rice.edu

In NSF Forum on Optical Science and Engineering, SPIE Proceedings Vol. 2524, 201-207 (SPIE, Bellingham, WA, 1995).


Abstract

Microscopy using vacuum ultraviolet and soft x-ray radiation offers high resolution, high contrast, and chemical sensitivity. Holography and contact printing are unique in their potential to achieve wavelength-limited resolution because they eliminate optical elements and their imperfections. Both methods, however, lack magnification and require high resolution films and methods to recover images. We present our results on source development and film characterization.

This work was jointly supported by the National Science Foundation, and the U.S. Air Force Office of Scientific Research.


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